Volume 4, Issue 3, May 2016, Page: 23-32
Studies on the Influence of Growth Time on the Rutile TiO2 Nanostructures Prepared on Si Substrates with Fabricated High-Sensitivity and Fast-Response p-n Heterojunction Photodiode
Abbas M. Selman, Department of Pharmacognosy and Medicinal Plants, Faculty of Pharmacy, University of Kufa, Najaf, Iraq; Institute of Nano Optoelectronic Research and Technology (INOR), UniversitiSains Malaysia, Penang, Malaysia
Received: Oct. 23, 2016;       Accepted: Nov. 8, 2016;       Published: Jan. 10, 2017
DOI: 10.11648/j.nano.20160403.11      View  3771      Downloads  126
Abstract
In this study, the effect of duration on the growth of rutile TiO2 nanostructures (Ns) deposited onto the p-Si (111) substrate on the structural, morphological, and optical properties of rutile TiO2 Ns has been investigated. All Si substrates were seeded with a TiO2 seed layer synthesized using a radio-frequency (RF) reactive magnetron sputtering system. Chemical bath deposition method (CBD) was employed to grow rutile TiO2 Ns on seeded Si substrates at duration time of growth (1, 2, 3, and 4 h). X-ray diffraction, Raman spectroscopy,and field-emission scanning electron microscopy (FESEM) analyses demonstrated the tetragonal rutile structure of the synthesized TiO2 Ns with the highest (110) peak intensity. Optical properties were investigatedby using photoluminescence (PL) spectroscopy of the grown rutile Ns, with the spectra exhibiting the sharpest (smallest FWHMs) and highest peak revealed the high quality of TiO2 Ns with few defects was found for the sample prepared for 3 h, which reflects the crystalline quality. These results show that the optimized growth conditions yield very high quality TiO2 Ns on p-type (111)-oriented silicon substrates. A fast-response p-n heterojunction photodiode was fabricated by depositing Al contacts on the front of the optimal sample via RF reactive magnetron sputtering. Upon illumination of a pulsed UV light (325 nm, 1.6 mW/cm2) at 5 V bias voltage, the device showed 3.8 × 102 sensitivity, the photoresponse peak was 460 mA/W, the response and recovery times were 50.8 and 57.8 ms, respectively.
Keywords
Titanium Dioxide, Rutile Nanostructures, Chemical Bath Deposition, Growthtime, Photodiode
To cite this article
Abbas M. Selman, Studies on the Influence of Growth Time on the Rutile TiO2 Nanostructures Prepared on Si Substrates with Fabricated High-Sensitivity and Fast-Response p-n Heterojunction Photodiode, American Journal of Nano Research and Applications. Vol. 4, No. 3, 2016, pp. 23-32. doi: 10.11648/j.nano.20160403.11
Copyright
Copyright © 2016 Authors retain the copyright of this article.
This article is an open access article distributed under the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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