Volume 8, Issue 3, September 2020, Page: 50-57
Influence of Metallic Copper Vapors on the Chemical Composition of a Mixture of Air and Water Vapor Thermal Plasmas in the Temperature Range 1000 K to 20000K
Kohio Nièssan, Laboratory of Materials and Environment (LAME), Department of Physics, University Joseph KI-ZERBO, Ouagadougou, Burkina Faso
Kagoné Abdoul Karim, Laboratory of Materials and Environment (LAME), Department of Physics, University Joseph KI-ZERBO, Ouagadougou, Burkina Faso
Yaguibou Wêpari Charles, Laboratory of Materials and Environment (LAME), Department of Physics, University Joseph KI-ZERBO, Ouagadougou, Burkina Faso
Koalaga Zacharie, Laboratory of Materials and Environment (LAME), Department of Physics, University Joseph KI-ZERBO, Ouagadougou, Burkina Faso
Zougmoré François, Laboratory of Materials and Environment (LAME), Department of Physics, University Joseph KI-ZERBO, Ouagadougou, Burkina Faso
Received: Aug. 18, 2020;       Accepted: Sep. 18, 2020;       Published: Oct. 12, 2020
DOI: 10.11648/j.nano.20200803.13      View  11      Downloads  12
Abstract
This paper concern the calculation of equilibrium composition of plasma mixture Air-Water vapor and copper vapor in temperatures range 1000K to 20000 K. The plasma is suposed to be in local thermodynamic equilibrium. We used Gibbs free energy minimization method to access the different numerical densities of chemical species as a function of temperature. This data are very important to calculate thermodynamic properties, transport coefficients and modeling electrical arc in circuit breakers. The result shows that the influence of metallic copper vapor is important on equilibrium composition of plasma. In particular the densities of electron in the plasma increase with the percentage of copper vapor for the temperature inferior to 17000K. The increasing of electron densities increase electrical conductivity of plasma and limit the performance of circuit breakers. Also the electrical neutrality is made mainly between electron (e-) and Cu+ in low temperature (T < 12000K). We are studying in particular the evolution of the densities of the main chemical species created in this plasma as a function of pressure. We choose four values of pressure (1 atm, 5 atm, 10 atm and 15 atm). The results obtained shows an increasing of chemical densities with the pressure in the mixture in conformity at Dalton's Law. the increasing of the pressure in the plasma retard chemical reactions because it disadvantages the dislocations that constitute dissociation and ionization reactions in the plasma.
Keywords
Plasma, Equilibrium Composition, Gibbs Free Energy, Copper, Electrical Neutrality
To cite this article
Kohio Nièssan, Kagoné Abdoul Karim, Yaguibou Wêpari Charles, Koalaga Zacharie, Zougmoré François, Influence of Metallic Copper Vapors on the Chemical Composition of a Mixture of Air and Water Vapor Thermal Plasmas in the Temperature Range 1000 K to 20000K, American Journal of Nano Research and Applications. Vol. 8, No. 3, 2020, pp. 50-57. doi: 10.11648/j.nano.20200803.13
Copyright
Copyright © 2020 Authors retain the copyright of this article.
This article is an open access article distributed under the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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