Different Methods Used for the Synthesis of TiO2 Based Nanomaterials: A Review
Azad Kumar,
Gajanan Pandey
Issue:
Volume 6, Issue 1, March 2018
Pages:
1-10
Received:
17 October 2017
Accepted:
30 October 2017
Published:
1 February 2018
Abstract: Titanium dioxide is a widely accepted photocatalyst due to its high oxidation efficiency, non-toxicity, high photostability, chemical inertness and environmentally friendly nature. There are several number of attempt have been made to synthesize TiO2 nanomaterials with different methods. In this paper we have to show the effect of synthesis methods and their surface morphology with temperature. The different methods are used for the synthesis of different Titania based nanomaterials. These methods are sol-gel method, sol method, electrodeposition method, micelle and reverse micelle methods, direct oxidation, chemical vapour deposition method, hydrothermal method, solvothermal method, Ultrasonication methods and microwave method. In this paper, we are summarizing the synthesis methods, morphology of Titania and crystal structure of the TiO2 nanomaterials. We are also showing the different nanostructures of TiO2 materials.
Abstract: Titanium dioxide is a widely accepted photocatalyst due to its high oxidation efficiency, non-toxicity, high photostability, chemical inertness and environmentally friendly nature. There are several number of attempt have been made to synthesize TiO2 nanomaterials with different methods. In this paper we have to show the effect of synthesis methods...
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Selective Pattern Transfer of Nano-Scale Features Generated by FE-SPL in 10 nm Thick Resist Layers
Martin Hofmann,
Cemal Aydogan,
Claudia Lenk,
Yana Krivoshapkina,
Steve Lenk,
Burkhard Volland,
Marcus Kaestner,
Burhanettin Erdem Alaca,
Eberhard Manske,
Ivo Rangelow
Issue:
Volume 6, Issue 1, March 2018
Pages:
11-20
Received:
8 January 2018
Accepted:
20 January 2018
Published:
7 March 2018
Abstract: High performance single nanometer lithography is an enabling technology for beyond CMOS devices. In this terms a novel mask- and development-less patterning scheme by using electric field, current controlled Scanning Probe Lithography (FE-SPL) in order to pattern structures on different samples was developed. This work aims to manufacture nanostructures into different resist by using FE-SPL, whereas plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the bottom Si substrate. The challenge for future quantum devices, generated by SPL and cryogenic etching, is finding a resist that is at most 10 nm in thickness and has a plasma durability high enough for pattern transfer into silicon. As a first step towards future quantum devices the silicon-to-resist selectivity of calixarene, AZ Barli, poly (3-hexylthiophen-2, 5-diyl) and polymethylmethacrylat for the anisotropic cryogenic dry etching process was estimated. A silicon-to-resist selectivity of about 4:1 for each of these resists was found. With these results, nano-scale, highly parallel double line features in silicon for future double patterning were generated.
Abstract: High performance single nanometer lithography is an enabling technology for beyond CMOS devices. In this terms a novel mask- and development-less patterning scheme by using electric field, current controlled Scanning Probe Lithography (FE-SPL) in order to pattern structures on different samples was developed. This work aims to manufacture nanostruc...
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